Vapor Phase Techniques for Semiconductor Manufacturing

Course Description

Comprehensive understanding of physical vapor deposition (PVD) and chemical vapor deposition (CVD) techniques and their crucial roles in semiconductor manufacturing; understanding of the principles, processes, and applications of PVD and CVD, with a specific focus on mass transport, heat transport, chemistry for CVD, epitaxy, vapor phase exchange, and CVD reactor design; topics include how to distinguish between PVD and CVD methods, effectively choose the most suitable CVD techniques for specific industrial applications, perform calculations related to mass transport, analyze heat transfer mechanisms, anticipate chemical reactions within deposition processes, apply epitaxial growth principles, optimize vapor phase exchange mechanisms, and engineer custom CVD reactor systems tailored to industry requirements; various aspects of semiconductor manufacturing, research, and development; exploration of the efficiency of film deposition processes, exert control over film characteristics, and actively contribute to the continuous advancement of semiconductor technology. Prerequisites: Junior or senior classification.

Code

SENG 442

Credits

3

Subject

SENG