Stony Brook University 3 credits CME
This course aims to provide graduate-level students with an in-depth acquaintance with important characterization methods that are applicable to surface science, soft materials, thin films and nanotechnology. Topics include techniques such as atomic force microscopy (AFM) including contact-mode, tapping-mode and lateral-force AFM, scanning tunneling microscopy (STM), electrostatic force microscopy (EFM), magnetic force microscopy (MFM), AFM-based nano-lithography, surface force and adhesion measurement, as well as molecular recognition, Xray photon spectroscopy (XPS) and ultraviolet photon spectroscopy (UPS), including basic principle, instrumentation configuration, data interpretation and analysis, chemical shift, quantification, and depth-profiling; time-of-flight secondary ion mass spectrometry (ToF-SIMS), Fourier-transform infrared spectroscopy (FTIR) and Raman spectroscopy, attenuated total reflection (ATR), diffuse reflectance, and polarization modulation-infrared reflection-adsorption spectroscopy (PM-IRRAS) and finally, scanning and transmission electron microscopy (SEM and TEM). In addition to the text, the student will be exposed to classic and current literature in the field. 3 credits Grading Letter graded (A, A-, B+, etc.)
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